Used M & R NANO TECHNOLOGY AG2000‐ 8NDSAV #293598392 for sale

M & R NANO TECHNOLOGY AG2000-8NDSAV mask aligner is a high-performance equipment that is used to accurately transfer patterns of fine electrical and optical circuits onto semiconductor substrates or Wafers. This mask aligner is designed to be both user-friendly and cost effective. It utilizes advanced algorithms and software that allow users to quickly and accurately align circuit patterns, while also monitoring the alignment process and results. The AG2000-8NDSAV provides optimal accuracy and also allows pattern sizes up to 12 mm by 12 mm with an alignment repeatability of 0.1 microns. This makes it ideal for use in the production of substrates for the manufacture of semiconductor integrated circuits and components. This machine employs an x-y fine-alignment axis for aligning the patterns. The AG2000-8NDSAV features an advanced "Ganfure" projection lens and a high-definition camera system. This unit also incorporates lithography optics and other components which enable users to precisely align the patterns onto the substrate. Once the patterns are aligned, the machine uses energy beams to transfer the patterns onto the substrate in order to create patterns. By controlling the energy beam exposure area and intensity, the tool ensures that the patterns are accurately transferred. This mask aligner also has a sophisticated substrate heating asset which ensures that the wafer temperature remains consistent during the entire lithography process. Another great feature of the AG2000-8NDSAV is its "Auto Sampling Scan". This feature ensures that the exposure of the patterns is consistent and uniform as it scans across the entire substrate. The model also has an easy to use data-recording process which allows users to store exposure data and analyze the results. Furthermore, the AG2000-8NDSAV has a powerful vacuum manifold design which allows for better waste gas treatment and energy efficiency. Additionally, this machine includes an advanced programming language that allows users to easily program and customize various alignment settings. In conclusion, M & R NANO TECHNOLOGY AG2000-8NDSAV masks aligner is a powerful, cost effective, and user-friendly equipment that is an excellent choice for producing complex substrates and integrated circuits. It provides users with precision pattern alignment and stage shutter control, as well as an auto sampling scan function. Furthermore, the powerful vacuum manifold design and data-recording process make this mask aligner an excellent choice for manufacturers of integrated circuits.