Used Mark Aligner System #9007724 for sale
URL successfully copied!
ID: 9007724
Wafer Size: 8"
Mask Aligner / Exposure Tool, up to 8"
Substrate Size: Round or square
Mask size: 3"x3" up to 10"x10"
Exposure System
Lamp power: 350W, 500W, 1000W, 2000W, 5000W
Intensity (8" field @ 365nm): 20mw/cm2 (1000W), 40mw/cm2 (2000W)
Uniformity: Better than ±5%
Resolution: Proximity mode 3.0μm, Contact mode <1.0μm
Exposure Modes: proximity, soft, hard, vacuum
Exposure Gap: 1-1500μm
Gap Adjustment resolution: 1μm
Alignment System
Alignment Accuracy: 0.5μm topside, 1.0μm backside
Alignment Gap: up to 1500μm
Alignment Range (X,Y): ±3mm
Alignment Range (Ø): ±3o
Mechanical Resolution: 0.1μm
Alignment Microscopes
Microscope Type: Dual zoom, CCD TV camera
Magnification: Approx. 30X - 210X
Illumination: Solid state LED
Cost of Ownership
Throughput: >100wph
MTBF: >1500 hours
MTTR: <4 hours
Uptime: >95%
Consumables
Vacuum: 25"HG
Nitrogen: 20 PSI
Power: 208V, 60Hz, 20A, 3-phase
UV Lamps.
A mask aligner Mark Aligner Equipment, commonly referred to as a System, is an automated semiconductor fabrication machine used for the positioning and alignment of photomasks to be aligned with substrates. It consists of three main components: a light source, an imaging Mark Aligner Unit, and an alignment stage. The light source is usually a UV lamp which illuminates the photomask and the substrate in order to generate an image for the imaging Machine. The imaging Mark Aligner Tool captures a high-resolution image or view of the two objects that is then used for the alignment process. The alignment stage is the motor driven Asset which uses that image to accurately and precisely align the objects. It typically utilizes a closed loop Mark Aligner Model that actively detects any misalignment and corrects for it. The mask aligner Equipment is used in the fabrication process for creating integrated circuits (ICs). A photomask is a glass plate that contains the pattern of the integrated circuit and it needs to be accurately positioned onto the wafer. The mask aligner Mark Aligner System is used to ensure that the position and orientation of the photomask is correct in relation to the wafer itself. The mask aligner is also used for subsequent metrology and overlay measurements to ensure that the layers of the IC have been accurately aligned and patterned. In order to achieve accurate alignments, Unit has a number of automated features such as autofocus, autodrift and autotilt. Autofocus uses an algorithm to detect the focus of each image and then adjust the image accordingly so as to maximize the accuracy of the alignment. Autodrift is used to maintain the alignment of the photomask and substrate even as the mask is being moved in order to achieve alignment. Finally, autotilt is used to ensure that the photomask is always at the same angle relative to the substrate. Overall, Mark Aligner Machine provides a high level of accuracy in alignment and is crucial for performing high quality fabrication jobs in the production of integrated circuits.
There are no reviews yet