Used MIDAS MDA-12FA #9382380 for sale

MIDAS MDA-12FA
Manufacturer
MIDAS
Model
MDA-12FA
ID: 9382380
Mask aligner / exposure system.
MIDAS MDA-12FA is a mask aligner used to transfer patterns of circuit components onto silicon photomasks. It is specifically designed for mask making applications that require a high degree of accuracy. The equipment consists of both hardware and software components. The hardware includes an optical microscope system, a high-resolution LCD monitor, an X-Y linear positioner, and a low-noise, high-resolution wafer stage. The software component includes automatic and manual pattern recognition algorithms, a Windows-based graphic user interface (GUI), a comprehensive automatic exposure control (AEC) unit, and a mask-design module. The unit offers 12 times microscopic magnification and fast pattern recognition. The alignment accuracy is 0.04 micron and the stage stability is at 0.Yes01 micron. The full resolution image contrast is 0.14 and full grayscale is 6 bits. An automated wafer position correction algorithm is included in the unit to reduce misalignment of incoming wafers. The machine is designed to be compatible with both photolithography (for exposure and development) and imaging applications (for data storage). It supports both positive and negative photomask applications and is capable of printing large images with up to 1000 dpi resolution. The unit is designed with multiple safety features such as automatic shut-off and emergency stops. The software tool offers the ability to view, edit and analyze complex patterns. The user can select and program resolution, size and rotation of patterns, as well as image grid and clip size. There are various tools such as measure, zoom, rotate, stretch and correct that can be used to optimize the positioning of patterns. The mask-design module can optimize the exposure parameters in order to reduce defects. MDA-12FA is versatile, affordable, and easy to use, making it a perfect choice for mask-maker applications that require high accuracy and flexibility. It offers unmatched performance, making it a valuable tool for photolithography professionals.
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