Used MIDAS MDA-12FA #9400525 for sale

Manufacturer
MIDAS
Model
MDA-12FA
ID: 9400525
Vintage: 2013
Mask aligner / Exposure system 2013 vintage.
MIDAS MDA-12FA is an advanced photolithography mask aligner designed for wafer-level device fabrication. It is designed to handle various types of chip-forming process, including high-throughput wafer-level metrology and wafer-level packaging. The equipment is capable of handling 6-inch, 8-inch, 12-inch and 15-inch wafers, which can be aligned accurately to a resolution of 50 microns or better. The system consists of a mainframe, lithography head, and a stage mechanism. The mainframe contains the power table and operating control systems, as well as the main electrical unit to power the machine components. The lithography head is the most important part of the tool, and contains a set of high-resolution optics and the main stage mechanism. The optics are used to precisely adjust the mask level, which ensures uniform exposure across the whole wafer. The stage mechanism allows for precise alignment of the wafer and mask along the X and Y axes. In addition to the main frame and lithography head, the asset also includes a range of tooling, including alignment monitors and software. The alignment monitor is used to measure the precise position of the wafer within the model. The software is used to control the various stages of the lithography process, including the concentration of the photoresist, exposure time, and focus level. MDA-12FA is designed to be integrated with other lithography systems and facilities, allowing for easier access to a wide range of feature sizes and levels of complexity. The equipment has features that can be adjusted to improve focus, and can also be used for high precision alignment and imaging of substrates. MIDAS MDA-12FA is an advanced mask aligner that provides improved wafer-level device fabrication. It is built to handle a wide range of chip-forming processes with precision alignment capabilities up to 50 microns. The system is easy to integrate with other lithography systems, and provides a range of features which can help to improve focus and imaging characteristics.
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