Used MIDAS MDA-400M #9276070 for sale
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ID: 9276070
Mask aligner and exposure system
Standard features:
Manual control system
GaAs Wafer sample size: 2"-3"
Mask size: 4" x 4"
System specification:
Light source module
UV Lamp power: 350 W
Maximum UV light source: 350 nm to 450 nm
Beam size: 4" x 4"
Microscope:
Dual CCD zoom microscope
Manual moving stage: Dual X, Y, Z Axis
Objective spacing: 60-150
Magnification: 80x-1,000x
Stage and controller module
Exposure timer: 0.1 sec to 999.9 Hours
Resolution
Utilities requirements:
Power supply: 220 VAC, 15 Amps, Single phase with ground.
MIDAS MDA-400M is an advanced Mask Aligner designed for precision photolithography applications. It is a high-end equipment that offers high resolution imaging capabilities and outstanding performance. The system is designed with the latest mask alignment technology and advanced software control. MIDAS MDA 400 M utilizes a microscope unit for pattern placement onto the substrate. The microscope offers a field of view up to 4" x 4" and a magnification of up to 50X. The image is displayed on an LCD with the help of the microscope machine for easier pattern review and placement. This tool also provides alignment accuracy of ≤2µm in the X-Y plane. The most outstanding feature of MDA-400M is its high imaging speed. The asset can produce a 4" x 4" field of view at 6 minutes flat. Additionally, the model also features adjustable beam current, adjustable focus depth, and adjustable line spacing. This allows users to make the most optimal exposure to achieve the desired pattern. The equipment is also designed with a sophisticated auto-focus system that works in combination with the microscope unit for extremely precise placement. The machine also comes with a revised vacuum optimization algorithm for enhanced performance and improved resolution. MDA 400 M also features a "shadow alignment" function for preventing a pattern from shifting from the desired focus area. The tool also provides a high degree of reliability in the mask data entry process. Additionally, the asset also features an easy-to-use graphical user interface that allows for smooth and efficient operation. Overall, MIDAS MDA-400M is a top-of-the-line Mask Aligner model that offers precise pattern placement and outstanding imaging capabilities. Its revolutionary design, advanced features, and high-performance make it an ideal choice for precision photolithography applications.
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