Used MIDAS MDA-80MS #9359652 for sale

MIDAS MDA-80MS
Manufacturer
MIDAS
Model
MDA-80MS
ID: 9359652
Mask aligner.
MIDAS MDA-80MS is a state-of-the-art mask aligner designed for photolithography imaging applications. It is capable of producing highly precise masks with nanometer-level accuracy and high repetition rate. The equipment provides a wide range of resolution capabilities ranging from 10 to 100 nanometer resolution. It can also accommodate various substrate materials such as plastic sheets, silicon, glass, and quartz. MDA-80MS has a set of advanced design features to ensure its accuracy and reliability. It has a highly optimized optical layout with dual objectives, which allows it to scan larger areas with higher accuracy. The system also features an array of automatic alignment functions to ensure precise alignment between the mask and substrate. Additionally, MIDAS MDA-80MS can be adjusted to accommodate a variety of substrate surfaces, such as flat, tapered, and corrugated. The unit is integrated with an automatic loading/unloading machine, which enables fast and accurate mask loading and unloading when switching between masks. It also includes a range of image-capture functions, such as 2-D imaging and mask visualization. These functions allow the user to accurately monitor the mask manufacturing process, allowing for precise feedback on the production process. MDA-80MS also features a range of lithographic-grade software and hardware to ensure maximum efficiency and accuracy. The tool can be integrated with a variety of programs and instruments, such as computers, CAD programs, and metrology/inspection systems. This allows for easy and efficient integration of MIDAS asset into a photolithography process. MIDAS MDA-80MS is a reliable, user-friendly, and highly advanced mask aligner that can be used in a wide range of photolithography applications. Its wide range of capabilities allows for precise and accurate alignment of masks to achieve optimal imaging results. Its advanced functions and integration capabilities make it an ideal choice for mask alignment in the photolithography process.
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