Used MIKASA M-2L #9156538 for sale

MIKASA M-2L is a high-precision resist mask aligner designed for lithography applications. M-2L is capable of aligning resist masks and components with a high level of accuracy, ensuring that photoresist patterns can be accurately transferred to a variety of substrates. The mask aligner features a two-lens equipment, to greatly reduce distortion and ensure accuracy across all layers. The optics feature a 1.2x optical magnification system for increased accuracy. MIKASA M-2L uses a pair of high-accuracy stepping motors and optical glass scale encoders to accurately adjust the position of the aligner. This ensures that all photomasks and layers are accurately aligned for optimum photolithographic applications. The M2-L also features a die-centering function to further ensure tight alignment of the resist mask. The mask aligner utilizes an intuitive software interface, providing adjustable parameters for repeatable accurate alignment of all layers. The M2-L supports various film types and substrates, and can be easily calibrated to meet specific requirements for each application. The software also offers a variety of programmable settings, allowing users to manage alignment accuracies, film thickness, heating and transfer speed. An LCD touchpad allows operators to quickly access the unit's multiple functions and manage all vital machine parameters. M-2L also utilizes a failsafe mechanism, which can be enabled to shut down the tool in case of an emergency. The mask aligner also features a built-in alignment monitor which can prompt real-time feedback, and quickly move the mask in case of any misalignment. Furthermore, MIKASA M-2L supports a wide range of standard resist masks, including 8", 12", and 16" masks, as well as a variety of non-standard sizes. The asset is also designed to interface with a wide variety of other resist processing equipment, such as spinners, hot plates, and printers. M-2L is an excellent choice for photolithography applications. The model is capable of precise alignment of resist masks and components, and its intuitive user interface and adjustable parameters make it extremely easy to use. The robust optics equipment and state-of-the-art failsafe mechanism ensure that accurate patterns can be quickly transferred to a variety of substrates.