Used MIKASA MA-20 #9394173 for sale

MIKASA MA-20 Mask Aligner is a highly precise and reliable mask aligner designed for aligning photomasks or reticles and wafers. This aligner provides precise alignment of reticles to both planar and 3D surfaces, and can be used to create patterns on silicon wafers with resolutions of up to 2 μm. It is especially suitable for semiconductor fabrication and other high-precision applications that require accurate reticle placement. MA-20 aligner features a vacuum chuck and XY-axis stage to enable precise and repeatable alignment. Its alignment equipment is based on the patented Laser Reflection Angle Measurement (LRAM) technology, using laser sources at various angles to measure the relative positions between the reticle and substrate. This aligner also incorporates an edge detection system to detect and accurately identify target signals, reducing the exposure time and ensuring superior precision. MIKASA MA-20's 260nm UV exposure unit enables production of smaller feature sizes withers extreme accuracy and repeatability. It is equipped with a high-power halogen lamp, a UV filter, and a shutter machine for precise exposure control. This aligner also features a three-dimensional heated incubator, which provides a controlled environment for accurate temperature control and extended reticle life. In addition, MA-20 is integrated with a web-based process monitoring and control tool that allows easy monitoring for production time and reticle life. It also allows users to adjust machine parameters remotely, while providing maintenance and reporting logs. MIKASA MA-20 has been designed for reliable and cost-effective operation for many years, providing users with an easy-to-use and efficient mask aligner with superior image registration and alignment accuracy. This aligner can be used to transfer patterns onto a wide variety of substrates, including silicon wafers, glass, ceramic, and other materials. With its combination of precision, repeatability, and versatility, MA-20 Mask Aligner is an ideal solution for advanced semiconductor fabrication processes.