Used NANO SYSTEM DL-100 #9208181 for sale

NANO Equipment DL-100 is a mask aligner designed for precision mask alignment for nano-scale patterning processes. The system is capable of processing wafers up to 4 inches in diameter, allowing it to be used in a wide range of applications. The unit is composed of three main components: the Aligner Unit, the Optical Stage, and the Wafer Stage. The Aligner Unit consists of a lens array and a control machine with real-time measurements and user-friendly software. The optical stage, which is the heart of the tool, is composed of a precision optical microscope and a high-resolution camera. The Wafer Stage is designed to ensure precise positioning and provide secure hold of the wafer during the alignment process. The optical microscope, with a magnification of up to 400x, is used to magnify the image and accurately position the pattern onto the wafer. The camera provides in-situ exposures of the patterned wafer and captures the alignment results. The software offers the user a wide range of alignment functions, including pattern recognition and automatic centering, that can greatly reduce the alignment time, thus maximizing productivity. The control asset also allows for a wide range of G-Code sequences and macro-programming for automating processes and streamlining the layout of patterns down to a single line of code. DL-100 offers high accuracy for pattern alignment, allowing the design to be presented accurately with a minimum amount of waste material. It is capable of producing complex and intricate patterns at high speed, and can make adjustments in real-time thanks to its advanced control model. This is beneficial for semiconductor industries due to its high throughput capability. NANO Equipment DL-100 is an ideal system for achieving high-precision patterns and processes. Its combination of powerful optics, advanced software, multi-axis control, and precise alignment can easily achieve the highest level of accuracy and speed for wafer process. With its versatile design, DL-100 can support a wide range of applications, including 3D patterning, deep etching, and thin film deposition.