Used NIKON Projection Aligner #200355 for sale

NIKON Projection Aligner is a mask aligner designed for advanced lithography applications such as microelectronic device fabrication, photomask production, and fine-line for hybrid circuits. This equipment features high accuracy, reliable alignment, and efficient operation. It utilizes advanced optical technology to provide precise alignment over a wide field of view, enabling higher yields and improved product quality. Projection Aligner features a two-lens optical system composed of a projection lens and a telescope. The unit's advanced alignment algorithm uses the contrast and contrast ratio of projected images for accurate alignment on areas of the device wafer that are generally too small for manual alignment. By utilizing telecentric optics with simultaneous two-axis (X-Y) movement of the mask, the machine enables accurate and reliable alignment of ≤ 200um patterns in time frames significantly shorter than a manual alignment. NIKON Projection Aligner is a 3-axis tool with a fast-scanning stage designed to quickly and accurately position the photomask in the projection direction. The fast-scanning stage also allows for automatic alignment and exposure on multiple sites of the substrate, making mass production possible. The lens-telescope asset is equipped with synchronous control for registration along the Z-axis and an autofocus model to ensure freeform projection imaging. Furthermore, the equipment has an external camera with LED light source and a high-resolution display for viewing the mask pattern or substrate pattern. This feature allows for manual adjustment if manual alignment is necessary. Projection Aligner also features a highly sensitive adjustment joystick and an intuitive user interface that allows for fast and easy operation with minimal training requirements. In summary, NIKON Projection Aligner offers high accuracy, reliable alignment, and efficient operation, making it ideal for high-tech lithography applications. The fast-scanning stage, intuitive user interface, and synchronous control along the Z-axis enable shorter time frames and increased production yield. Additionally, the external camera and LED light source allow for manual alignment and viewing of the substrate and mask pattern, ensuring accurate registration of the photomask.