Used OAI 30-079-31 #9026299 for sale

OAI 30-079-31 is a mask aligner designed for photolithography and photography needs. It is used to process, with the help of masking, a wide range of substrates and materials such as glass, silicon, dies, PCBs and wafers. 30-079-31 mask aligner features a large clear substrate area and a non-contact, non-destructive exposure mechanism. It is equipped with several high-tech machinery including an advanced ion accelerometer that allows for improved alignment accuracy and a large collimator that ensures a homogenous irradiation pattern. Additionally, its expandable and well-structured optical system features many technical capabilities including the ability to process substrates up to 2000 mm in size, and its advanced machine vision system allows for complex patterns and image analysis. For patterning, OAI 30-079-31 utilizes rectilinear, circular or matrix alignment techniques. Additionally, its stepper motors allow for high-precision adjustment and have superb pointing accuracy, enabling maximum flexibility and control when applying patterns. Furthermore, the equipment is also highly configurable and able to program different parameters. Such parameters include the number of exposures, lens power, exposure time, pulse repetition rate, irradiated area and wavelength. Its design also features user-friendly software with an intuitive graphical user interface (GUI). 30-079-31 is designed to be used in a wide range of industries due to its wide range of processes and configurations. It has proven to be effective in the automotive, optoelectronics, aerospace, semiconductor and printed circuit boards (PCB) manufacturing. Overall, OAI 30-079-31 mask aligner facilitates the photolithography and photography process for a wide range of materials and substrates. It enables precise and reliable alignment and is also highly configurable with a user-friendly GUI. It's an ideal tool for a vast array of industries, from automotive to optoelectronics.