Used OAI 5008 #9155197 for sale

OAI 5008 is a high-precision mask aligner designed for next generation photolithography applications. It is a full-field UV-exposure equipment that uses light source and stepper technology that is capable of supporting a wide range of wafer sizes, from 100mm to 8-inch (200mm) substrates. 5008 is built to ensure accurate exposure of the photomask onto the wafer. It does this by using stepper positioning accuracy, and by providing a repeatability of ±0.5 μm. The system offers a large dynamic range in exposure energy, from 0.2 millijoules to 20mJ, and a wide range of multiple exposure options. The unit features a laser interferometer machine which provides absolute alignment, and a contour illumination optics tool which enables uniform exposure quality. Furthermore, it has automatic vision alignment with a maximum accuracy of 1.5 μm as well as automated alignment optimization algorithms. The asset also has various control systems which offer a wide range of features to enhance its performance. It features a Process control software which has various features such as exposure parameter control, exposure management, and monitoring, and performance report in order to ensure a consistent and high performance. In addition, it also has an Advanced Process Control (APC) model with Statistical Process Control (SPC) and Real-Time Optimary (RTO) modules to precisely monitor and improve process performance. OAI 5008 is a top-of-the-line mask aligner which offers excellent accuracy, reliability, and consistency. Its high-precision features make it the ideal choice for a photolithography equipment. The system is highly configurable, allowing it to fulfill the needs of different types of lithography processes. It is also efficient, providing high throughputs with low defect levels.