Used OAI 804MBA-086265 #9384029 for sale

OAI 804MBA-086265 is a highly-accurate optical mask aligner suitable for automated lithography operations. This mask aligner enables high-volume production of integrated circuits as it can increase throughput with its fast throughput alignment to 0.2 microns. It is equipped with State Core open-loop alignment equipment comprised of two alignment cameras and four independent laser channels. This enables precise alignment capabilities of sub-micron (<0.5 micron) optical photolithography masks. 804MBA-086265 also has an automated immersion lens focus and alignment system which is capable of measuring the surface of the wafer within 9.6 µm of accuracy and achieving a high precision focus every time. This ensures that any number of masks can be accurately aligned and accurately focused, even without the use of manual intervention. The aligner is also compatible with digital pattern generation with its high speed electron beam writing unit allowing for fast fabrication of simple masks. This mask aligner is ideal for manufacturing delicate structures with small feature sizes as the optical alignment experts are capable of imaging small features as low as 0.1 microns and feature sizes smaller than 0.5 microns due to its High Contrast Imaging (HCI) which optimizes both throughput and resolution. In addition, OAI 804MBA-086265 provides multiple optical modes for various processes to ensure repeatable, accurate performance. It is user-friendly as it allows for the construction of multiple masks by different CAD systems over multiple platforms and it enables easy integration with modern lithographic tools. It also supports multiple substrate sizes and tolerances, providing reliable operation in high volume production environments. This makes it suitable for use in semiconductor fabrication plants, University research labs, and other settings where accuracy, reliability, and repeatability are needed. This advanced mask aligner is designed to provide maximum effectiveness with minimized operators' participation, increased throughput, improved alignment accuracy, reduced cycle times, enhanced machine performance and more efficient use of labor. This cost-effective solution is designed to have a high level of compatibility with a range of advanced lithography processes. This ensures that it provides easy integration of advanced lithography tools into existing manufacturing processes. 804MBA-086265 is designed to be the best option for customers looking for the capability to achieve optimal throughput and cost efficiency in high volume production of integrated circuits.