Used OAI Hybralign 200 #293590397 for sale

OAI Hybralign 200
Manufacturer
OAI
Model
Hybralign 200
ID: 293590397
Mask aligner Top Side Alignment (TSA).
OAI Hybralign 200 is a semi-automated mask aligner that provides an advanced patterning platform for optical lithography. This equipment is used to create patterns on photomasks, which helps in creating high resolution structures with precise dimensions. The equipment uses extreme ultraviolet projected imaging to obtain the desired patterns on the photomask. The system is designed with a two-beam projection unit which is ideal for most lithography applications. Its spatial light modulator is integrated with a laser projection tool to enable precise patterning of the photomask. The laser projection tool uses a galvanometer for its dynamic optical alignment and compensating errors due to mechanical vibration and temperature variations. This ensures high precision alignment without any mask-to-mask errors. The machine's automated patterning engine provides flexibility to generate a wide range of feature sizes and layouts with high precision. The tool is equipped with a CCD camera monitoring tool for image vector alignment and display. This helps in checking the patterning status during the entire process. Its external alignment laser integration allows for more precise alignment which helps to achieve higher yields in fabrication. The machine also provides advanced overlay tolerances by taking into account mechanical and optical aberrations in photomask layout. The integrated process management software is designed to interface with job-scheduling software and CIM systems. This helps to create automated processes for photomask fabrication, which helps to optimize the throughput of the asset. The model is a reliable solution for the production of high quality photomasks for use in optical lithography. Its advanced features and enhanced specs ensure accurate results in any application. Hybralign 200 provides high process control and accuracy which is essential in the fabrication of high resolution photomask structures.
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