Used OAI HYBRALIGN 400 #9140530 for sale

OAI HYBRALIGN 400 is an advanced mask aligner equipment for microlithography applications. This system is one of the most precise and reliable mask aligners available on the market. HYBRALIGN 400 is a hybrid unit that combines a bottom-up alignment (alignment based on the mask image) and top-down alignment (alignment based on the wafer image). The bottom-up alignment function enables an extremely precise and reliable image alignment; while the top-down alignment ensures accuracy of critical dimensions on the wafer. The machine is able to identify small tapers and geometries in the mask and wafer images with high accuracy. OAI HYBRALIGN 400 is capable of controlling the alignment to within 1 µm using an ultra-high resolution CCD alignment sensor. It is also equipped with a high-speed and high-precision scanning stage that is able to achieve a maximum stage speed of up to 200 mm/s. HYBRALIGN 400 supports sophisticated off-axis alignments for air gap applications and provides anti-blooming technology to avoid over-exposure of the alignment center on the device wafer. The tool is equipped with high-performance parallel GPU computing power to improve through-put and reduce running times. OAI HYBRALIGN 400 also features an intuitive user interface to enable efficient and easy operation. It can be networked with software systems to allow data exchange and remote operation. It provides real-time informative data to monitor and adjust the alignment process, and can be operated in quiet and cleanroom environments. HYBRALIGN 400 mask aligner provides advanced capabilities and precision for microlithography applications, making it an ideal asset for use in a variety of industries, such as semiconductor, display, medical, and optical device manufacturing.