Used OAI HYBRALIGN 500 #9012380 for sale

Manufacturer
OAI
Model
HYBRALIGN 500
ID: 9012380
Wafer Size: 6"
Mask aligner Currently set up for 6" OAI model 783 illuminator supply and controller Converted to Nikon microscope; includes original Zeiss dual channel scope.
OAI HYBRALIGN 500 is a professional mask aligner used for lithography processes in the development of Integrated Circuits (IC). It is a type of stepper that is used to image patterns on to a substrate. HYBRALIGN 500 is a dual field machine, meaning it has two fields that can be used to image simultaneously. This allows for rapid exchanges between fields and the vertical alignment of different masks within the same pattern. OAI HYBRALIGN 500 has a resolution of 0.2 μm or greater, depending on the stepper parameters. Its features include depth of focus optimization, UV light exposure, and align and focus system. It also includes Exposure Control Unit (ECU), which is used to optimize the settings for each exposure in order to ensure the highest accuracy and the highest image quality. The processor then compiles the exposure data and sends it directly to the aligner. HYBRALIGN 500 is also equipped with an Aspheric Column allowing for the most precise alignment and highest resolution in matching the patterns. It also has an advanced mask alignment system which can compensate for any differences in the patterns due to stepper shift. Furthermore, it has an Anti Drift System which constantly keeps the misalignment within the maximum allowed value, thus improving the overall yields for the lithography process. The machine also supports a range of mask sizes up to 8 inches, with both direct and indirect imaging capabilities such as laser resist exposure and laser source directed exposure. In addition, it includes a Clean Contamination Core unit for minimising contamination, and an option for sub-field imaging with a built-in rotation stage. OAI HYBRALIGN 500 has several built-in features such as a knife edge method, the Bessel beam method and air bearing table drive which permit precise control of exposures and image resolution. Additionally, HYBRALIGN 500 is ergonomically designed for easy maintenance and smooth operation. It is also compatible with various types of steppers, making it applicable for a range of industries. Overall, OAI HYBRALIGN 500 is a highly advanced mask aligner that provides excellent image resolution and high precision lithography for the development of Integrated Circuits. Its advanced features not only provide high yields but also maximize throughput and reduce defects in the fabrication process.
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