Used OAI Hybralign Series 400 #9096376 for sale

OAI Hybralign Series 400 is a mask aligner that is designed to produce precise and high-quality masks for photolithography applications in the semiconductor industry. It uses an advanced optical imaging system that can image and etch features as small as two microns in size. The mask aligner features a wafer stage capable of reaching a repeatability of three microns. The stage can accommodate large wafers with a maximum diameter of 300 millimeters. Hybralign Series 400 uses a combination of microscopes and laser aligning to precisely align the mask patterns onto the wafer. It uses a high-resolution optical light microscope with an up to 10x magnification to accurately detect and sharply lock the alignment of the patterns. Additionally, the laser alignment system provides high-precision scanning of the wafer to align the image with four or five points of reference. The Hybralign's alignment accuracy is extremely precise, with a repositioning accuracy of +/- 0.5μm. This ensures that the features of the mask patterns are precisely and accurately reproduced on the wafer. It is also capable of etching layers with a range of depths depending on the desired application. OAI Hybralign Series 400 also features a user-friendly interface that allows users to quickly set up and run jobs. It is also designed to be compatible with GDS II format files, making it easier to read and visualize the mask patterns. Additionally, the set-up and alignment process can be monitored remotely through the control panel. Overall, Hybralign Series 400 is a high-precision mask aligner that is specifically designed for photolithography applications in the semiconductor industry. Its advanced optical imaging and laser alignment system ensures that it can produce precise and high-quality masks with an up to 0.5μm positioning accuracy. Additionally, its user-friendly interface allows users to quickly set up and run jobs, and it is also GDS II format compatible.