Used OAI J500 / VIS #293741977 for sale
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ID: 293741977
Mask aligner
Illuminator: 310 nm
Mirror and illumination
No visible illuminator.
OAI J500 / VIS is a mask aligner for lithographic wafer patterning. It is used in various industries, including optoelectronic, nanoelectronic and MEMS (microelectrical mechanical systems) fabrication. In the technology of photolithography, J500 / VIS mask aligner is a critical part of the lithographic process. OAI J500 / VIS is a high-precision mask aligner. It features separate imaging and masking stages, making it possible to image different processing layers with each photolithographic step. This enhances throughput, simplifies mask exchange processes and maintains the high level of accuracy needed to pattern complex integrated circuits. The precision of the imaging lens and the accuracy of the mask registration electronics are both extremely important for the precision of the alignment. J500 / VIS features advanced optics, a 445nm laser, and a highly-technical CCD camera array with processing resolutions in sub-micrometer range that ensures precise positioning. The alignment accuracy of OAI J500 / VIS is extremely precise. It offers 0.3 micron repetition accuracy - about twice that of current industry standard. This accuracy is maintained at imaging resolutions between 400nm and 1µm. Features as small as 4.0µm in width can be accurately processed. Additionally, J500 / VIS features an enhanced overlay function, which reduces the total number of alignment steps needed compared to traditional mask aligners and improves the process of wafer exposure. Plus, the system also utilizes near-field optical inspection (NFOI) that enables the system to see beyond the limits of traditional imaging depth-of-field (DOF). OAI J500 / VIS also allows for a wide range of masking capabilities due to its multiple mask-processing capabilities. It supports single- or double-sided mask processing, and both simple- and complex-mask processing. The system also features full-size mask scanning, a precise stepping effect, and automated mask alignment. Plus, it can process different mask sizes and materials, making it well-suited for various patterning applications. In addition, J500 / VIS is highly user-friendly, making it easy to learn and operate. Its intuitive graphical user interface (GUI) and its color touch screen make it easy to input, modify, and store parameters and recipes for precise, repeatable exposures. Plus, its remote memory upload capabilities mean process information can quickly, accurately and securely be transferred from one machine to another. Overall, OAI J500 / VIS has proven itself as a reliable and precise mask aligner for lithographic wafer patterning, providing excellent capabilities for complex integrated circuit fabrication.
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