Used ORIEL 82330 #188526 for sale

ORIEL 82330 is an automated mask aligner that is used in the field semiconductor lithography. It has a 325nm maximum exposure wavelength, a 50nm lateral resolution, a 3um depth of focus, and a 2um/sec fine motion speed. The precise positioning is controlled by an XY table with 0.5um resolution. The flat basis platen is designed to allow flat substrates of up to 8.5 by 4.5 inches with a maximum thickness of 1mm, and a maximum weight of 4kg. The platen is durable and features a redesigned suction system for less maintenance. This allows samples to be held securely in place for higher precision alignment. 82330 also offers an autofocus system, proprietary wafer alignment software, and an exposure log. This allows for highly accurate alignment of the pattern over the substrate, and records the focus conditions and exposure parameters used to the memory card. The autofocus system is also capable of optimizing focus over the entire field of view for higher precision results. ORIEL 82330 is equipped with an electron-beam compatible coater module for the on-site coating of photoresist. Notable features of this module include a vacuum coating base, editable temperatures up to 100 degrees Celsius, and mist-free coating. The suite of laboratory thermal processing equipment is tailored for applications such as degassing, spinning, and baking. It includes a ten station spinner with adjustable speed from 0 to 2000 rpm, a hotplate with temperatures up to 400 degrees Celsius, a two-stage vacuum oven, and an in-situ cool station. 82330 has a host of automated tools that make semiconductor lithography simpler. The vacuum chamber has an adjustable height to accommodate different samples, while the alignment tools guarantee accurate alignment and precise backside patterning. The coater module also ensures uniform coverage of photoresist, and processing tools allow for fast and uniform baking of samples. This aligner is designed to integrate easily with other laboratory equipment to meet the exact needs of any semiconductor lithography application.