Used PERKIN ELMER 300 #9174286 for sale

PERKIN ELMER 300 is a mask aligner used for photolithography - a type of process used to create patterns on a substrate. It is a high-precision alignment tool used to accurately reproduce the features from a photomask onto a silicon wafer, or other substrates. 300 is particularly used for photolithography processes in semiconductor and other related industries. PERKIN ELMER 300 operates using an x-axis, y-axis, and theta (θ) axis. It can perform all three levels of alignment: one-dimensional, two-dimensional, and three-dimensional. The x-axis and y-axis are responsible for lateral positioning, and the theta axis for rotational alignment. The precision alignment afforded by 300 ensures that the pattern on the photomask is accurately reproduced on the semi-conductor wafer. This is achieved by accurately aligning the silicon substrate relative to the photomask using the x-axis, y-axis, and theta axis of the machine. PERKIN ELMER 300 employs optical vision recognition and auto-alignment techniques for the alignment process. The optical vision recognition equipment detects the pattern on the substrate, while the auto-alignment system automatically performs the alignment procedure. Additionally, 300 is equipped with an adjustable aperture which allows for adjustment of the exposure dose of the photomask onto the substrate. This helps reduce the variability of the lithography process and increase the accuracy of the pattern transfer. PERKIN ELMER 300 also features an imaging unit that uses ultraviolet and visible light to inspect the substrate and photosensitivity of the materials used. This inspection helps detect defects or any irregularities in the substrate prior to imaging. The machine can also be used to measure the thickness and step heights of the substrate, as well as create cross section images. 300 is a powerful and efficient tool used by many laboratories for photolithographic processes. It is one of the most widely used mask aligners in the semiconductor industry as it provides a fast and accurate method for pattern transfer from a photomask to a substrate. The ease of operation and high precision offered by PERKIN ELMER 300 makes it an ideal choice for companies and laboratories working in the semiconductor industry.