Used PERKIN ELMER 600 series HT #195230 for sale

PERKIN ELMER 600 series HT is an advanced mask aligner equipment equipped with a high-precision stepper motor motion controller which enables it to accurately align delicate masks to substrates for semiconductor fabrication. The system features a heated substrate holder, a theta stage for precise angular orientation, and an x-y translation stage capable of both step-and-repeat and continuous motion operations. The unit is optimized for photolithographic process control, with capabilities for advanced exposure control, alignment feedback for ten-times magnification stepper alignment, and on-axis imaging for better focusing accuracy. To effectively align delicate masks, 600 series HT utilizes a fully programmable heuristic mask alignment algorithm which automatically optimizes exposures based on variable wafer and mask configurations. This algorithm ensures that the active layers of the mask are always in proper focus on the wafer, preventing misalignment caused by the wafer stack height differences. In addition, the machine allows for a "dwell" period between exposures, which helps to reduce mask-mask misregistration and improve process repeatability. PERKIN ELMER 600 series HT also features an advanced optical microscope imaging tool with on-axis imaging which provides a significant improvement in focusing accuracy over off-axis systems. This enables the asset to accurately identify and focus on critical alignment marks on layers near the surface of the mask or substrate, making this model ideal for manufacturing fabs that require tight focus control. 600 series HT is further outfitted with a user-selectable wafer size thus allowing an operator to easily select their desired wafer size during setup. This reduced set-up time coupled with automatic exposure optimization provides fast alignment and focus repeatability between exposures. The equipment also offers an advanced air-powered cooling subsystem which allows for higher throughput while avoiding damage that typically occurs from water cooling. The system can be set to provide cooling just prior to the exposure of each layer, allowing for cooler wafers and shorter exposure times. In summary, PERKIN ELMER 600 series HT is an advanced mask aligner unit optimized for photolithography process control. This machine features a user-programmable heuristic alignment algorithm for accurately aligning delicate masks, an advanced on-axis imaging tool for better focusing accuracy, air-powered cooling to reduce damage and increase throughput, and a user-selectable wafer size for easy set-up and fast alignment.