Used PERKIN ELMER Micralign 220 #9233008 for sale

PERKIN ELMER Micralign 220 Mask Aligner is a versatile aligner for semiconductor photolithography masking that provides superior results with high accuracy. It is an ideal tool for a range of applications, from low- to medium-volume production of components that require seamless, accurate transitions from one layer to the next. Micralign 220 Mask Aligner employs two, opposing, X-Y stages to precisely position a shield and expose wafers to 18 x 20, and 36 x 40mm substrates. Three dimensional measurements of the wafer, water, and alignment lift surface ensure accuracy and the equipment's one-micron level of accuracy. This accuracy is achieved by using the pad-level control of stepper motion, combined with an XY-cross-telecentric sensing system that guarantees drift-free operation. PERKIN ELMER Micralign 220 Mask Aligner also provides optional integrated wafer handling that enables separate alignment and exposure. The unit features a stepper-driven alignment mechanism that allows for a wide range of alignment angles and can also perform parallel or serial alignment. It uses high-powered, multi-spectral optical projection to obtain 25 micrometer or better alignment accuracy and a minimum feature size of 3 micrometers. Micralign 220 Mask Aligner is designed for high-throughput applications and the optional multi-exposure machine ensures simultaneous exposure of multiple substrates for greater efficiency. PERKIN ELMER Micralign 220 Mask Aligner also includes an intuitive user interface, making it easy to control and use. It has a built-in calibration tool that automatically adjusts the asset when exposures occur outside of the target window. The model is also equipped with a patented MEMS (micro electro-mechanical equipment) phase-shifting system that ensures that all of the various exposures have achieved the same phase-shifting during overlays and that overall process stability is maintained. Finally, the unit includes a temperature and humidity control machine that ensures that the alignment and exposure process is performed in the optimal environment. Micralign 220 Mask Aligner is designed for maximum repeatability and accuracy and is the perfect tool for a variety of mask alignment and photolithography applications. Its versatility and intuitive user interface make it an ideal tool for applications that require high-accuracy and speed.