Used QUINTEL / NEUTRONIX 7000 #293631832 for sale

QUINTEL / NEUTRONIX 7000 Mask Aligner is a computer-controlled automated aligner equipment designed to enable reliable, precision alignment of various photomasks and wafers in the production of semiconductor devices. This high-performance system offers a fully automatic process for aligning photomasks to wafers, providing superior performance for both fine alignment and coarse alignment. The unit is equipped with two independent masking units with automatic alignment Capable of registering accuracy of 5um or less. This ensures proper placement of masks onto the substrates before exposure. The machine makes use of a very high vacuum contamination-controlled environment, which assists to maintain the highest possible resolution and throughput when using highly sensitive photomasks. The tool uses digital motor controls to move the mask during alignment and exposure. This motion control ensures accurate position and dynamic imaging of the photomask. It also comes with an advanced optical alignment asset that uses adjustable telecentric optics to improve resolution and match the optical characteristics of a variety of substrates including SiO2, SiN, polyimide, and glass. QUINTEL 7000 Mask Aligner is a form of dedicated mask aligner specifically designed to produce higher yield quality devices than custom production photomasks. It's also capable of efficiently handling metal patterning, array printing, and more. The model is precision-engineered to enable smooth, repeatable, and reliable alignment of photomasks as well as substrates of various sizes, thicknesses, and shapes, including rounded ones. Overall, NEUTRONIX 7000 Mask Aligner is a reliable and efficient automated equipment for producing high-quality devices by precisely aligning photomasks to wafers. It offers an unrivaled combination of speed, accuracy and precision for both fine and coarse alignment tasks. The system also features advanced motor control, optical alignment, and vacuum control, ensuring reliable and accurate alignment of photomasks to substrates.