Used QUINTEL / NEUTRONIX 7000 #293816223 for sale

QUINTEL / NEUTRONIX 7000 Mask Aligner is a high-precision lithography tool used in the manufacture of semiconductor chips. It is an upgradeable equipment which offers an advanced, cost effective, reliable and accurate lithography solution for the production of various device structures, including ultra-thin line widths. QUINTEL 7000 Mask Aligner is a multi-axis, moveable masking system that utilizes an advanced stepper motor and a laser-based tile pattern generator to accurately position a mask prototype onto the substrate during lithography. The unit enables alignment of the mask patterns to the substrate with a flat field of view, regardless of the size or shape of the mask design. With a maximum resolution of 3 μm, the machine is capable of producing high precision, nanoscale features on a wide range of substrates, such as silicon-on-insulator (SOI). NEUTRONIX 7000 Mask Aligner consists of an advanced stepper motor and an opto-mechanical assembly. The stepper motor is used to accurately and precisely position the mask prototypes against a flat field of view. It is coupled with a laminated pattern generator which is capable of producing the tile patterns on the substrate, enabling users to accurately match the design onto the substrate. The opto-mechanical assembly provides high-resolution alignment under flat field illumination and helps reduce mask vibration and distortion caused due to the mask movement on the substrate. This mask aligner is designed with advanced features to ensure low-defect production. It comes with a two-axis tool consisting of a central positioning plate and a transportable carriage, which are both driven by the stepper motor. The asset also features an automated alignment model which allows user-programmed wafer displacement and rotation in X, Y, and Z axis. The integrated wafer-handling equipment enables faster substrate loading and unloading, which streamlines the production process. Overall, 7000 Mask Aligner offers highly precise and accurate alignment for producing minute features on various substrates. This lithography system offers enhanced performance, precise and repeatable alignment, and high throughput. Its modular design and upgradeable software makes it a versatile and cost-effective solution for prototyping and production applications.