Used QUINTEL / NEUTRONIX Q7000 IR #9063417 for sale

QUINTEL Q7000 is a versatile, high performing mask aligner used for photolithography applications in the production of devices such as semiconductors and optoelectronics. It is capable of exposing a wide range of materials including quartz, glass, metal, ceramics, and wafers. The Q7000 has a large working field of 16"x16", allowing for accurate alignment of components during lithography processes. Its advanced optics, digital imaging and vacuum-actuated airlock equipment ensure uniform light exposure and accurate positioning of the photomask. Accuracies of up to 0.5 micron can be attained when using the system's optional autofocus and image stitching functions. The unit has a built-in gas and chemical delivery machine to ensure controllable source gases and chemical reagents during the lithography process. The integrated touch screen PC provides access to measurement and alignment functions, while the dual-master interferometer tool offers enhanced optics to reduce exposure time and improve alignment accuracy. The asset is designed to minimize contamination and provide maximum resolution with its low-temperature (~ 5°C), low-humidity, Faraday cage-enclosed environment and resistant to particulate contamination. Its win/win auto instruction and data storage parameters allow you to easily maximize the throughput from the alignment process. The model is also equipped with dual-beam capabilities that provide simultaneous images for two different wavelength patterns for enhanced resolution, accuracy and speed of aligning. Its superior air filtration equipment ensures that only clean air is introduced into the system's environment. For safety, the Q7000 has an Over-ride lock key and fully integrated warning unit, so that it can be used without compromising the safety of personnel. The machine also has a number of options that can be customized to meet the requirements of various production processes. QUINTEL / NEUTRONIX Q7000 IR is an ideal tool for applications including semiconductor, MEMS, and optoelectronic device fabrication, as well as any process that requires precision photolithography and mask alignment.