Used QUINTEL / NEUTRONIX Q7000 IR #9191163 for sale

QUINTEL / NEUTRONIX Q7000 IR is a production mask aligner designed for use in semiconductor production. It is capable of producing lithography patterns with a high degree of accuracy and precision, allowing for the manufacture of highly precise integrated circuits. QUINTEL Q7000 IR is composed of a large frame with a large, vacuum-sealed exposure chamber at its center. This chamber features a variety of high-precision lenses and mirrors that are controlled by a digital control equipment. This system is designed to produce crystals with maximum spacial resolution, allowing for accurate lithography patterns over the entire work area. NEUTRONIX Q7000 IR also features a precise pattern generator. This generator accurately aligns the lithography mask to the quartz substrate, ensuring perfect lithography patterns. The alignment process is enhanced by a three-axis control unit and a video terminal for optimization. The device also features an adjustable infrared (IR) laser source, which is used to etch fine resistance patterns into the substrate. The machine is also capable of controlling the laser intensity, as well as laser power, depending on the circuits being produced. Q7000 IR also includes a high-speed loader and unloader, to ensure each substrate is quickly processed and stored efficiently. The device also features an efficient chemical management tool, which ensures that the high-speed laser production process does not cause any contamination or degradation of materials. For accurate measurements and analysis, QUINTEL / NEUTRONIX Q7000 IR features an optical test asset. This model accurately measures the minuscule lithography patterns and the circuit's electrical properties. The device also offers real-time monitoring of wafer fabrication, allowing for adjustments in the wafer's production settings to produce high-quality circuits with reduced scrap rate. In conclusion, QUINTEL Q7000 IR mask aligner is an advanced production device used in semiconductor fabrication. It offers the ability to produce highly accurate lithography patterns on quartz substrates, as well as control the laser intensity and power. It also includes a high-speed loader and unloader and an optical test equipment for measuring small lithography patterns and circuits' electrical properties.