Used QUINTEL / NEUTRONIX Ultraline 7000 #200801 for sale

QUINTEL / NEUTRONIX Ultraline 7000 is a precise, automated mask aligner used in the photolithography process, in which patterns are transferred onto the surfaces of semiconductor chips. QUINTEL Ultraline 7000 offers a high precision and a large format imaging equipment, featuring a vacuum chamber designed to generate repeatable and reliable results. At the heart of NEUTRONIX Ultraline 7000 is its wafer stage, a sophisticated piezoelectric component that moves the substrate with extreme accuracy. The wafer stage is 5" in diameter and is designed to support a wide range of substrates, with a maximum of 8" in diameter and a maximum weight of 600 lb. The system provides a positioning precision of ±3 µm and a repeatability of ±2 µm. Ultraline 7000 also includes a lithography head, featuring energy sources such as Ultraviolet light of 267 nm or 351 nm and irradiation angles of 0° or 90°. QUINTEL / NEUTRONIX Ultraline 7000 is also integrated with an advanced optical unit including a digital camera, microscope objectives, and protective filters that improve image contrast. The machine has the capability of using filters that can block out-of-band radiation to minimize surface contamination. QUINTEL Ultraline 7000 facilitates exposure control with a maintenance-free insert photomask, a quartz plate with quartz cylinders filled with heavy metals, precisely designed to transmit (or block) radiation. It also uses a vacuum tool to ensure repeatable uniform vacuum in the wafer chamber and an integrated automatic nozzle cleaning asset for more reliable exposures. NEUTRONIX Ultraline 7000 does not require any external gas supply model, and the electrical equipment operates independently of any electrical connection so the process is quickly set up. The system also includes a polymer robot arm with gripper arms for loading and unloading of wafers and masks. Overall, Ultraline 7000 is an effective, automated mask aligner capable of producing precise and consistent results for photolithography. By using its advanced features, the machine can help create high-quality devices that will improve the efficiency and performance of semiconductor products.