Used QUINTEL / NEUTRONIX Ultraline 7000 #293618166 for sale

QUINTEL / NEUTRONIX Ultraline 7000 Mask Aligner is highly efficient and accurate microelectronics fabrication equipment used to create accurate and repeatable chip designs. It is used to align and expose specific patterns on to a wafer targeted by a focused light source, such as a laser. It is designed to perform advanced lithography processes in silicon and compound semiconductor processing, enabling rapid and accurate production of large-scale integrated (LSI) circuit designs. The basic operation of QUINTEL Ultraline 7000 consists of exposing the prepped wafer with a mask, meaning an image carrying the desired pattern, and aligning it with the exact coordinates of the photolithography process. The Mask Aligner consists of a frame, on which the laser and its optics are mounted, as well as the X-Y stage assemblies, which move the wafer during the exposure process. The fine positioning of the wafer is of utmost importance for accurate photolithography, and NEUTRONIX Ultraline 7000 provides two micron X-Y accuracies at 200 um/sec speeds. Its modularity allows for several integration options, and as with most QUINTEL products, its control system can be easily and quickly networked to other tools, in order to create a more automated and efficient process. Ultraline 7000 can be loaded with a variety of lens types, such as 0.5 micron lenses, 1.0 micron lenses, 1.5 micron and 2.0 micron lenses, allowing it to effectively cover a wide range of applications. Furthermore, QUINTEL / NEUTRONIX Ultraline 7000 Mask Aligner is equipped with various safety features, such as gas protection and auto shutdown in case of wafer breakage or power failure. It also features auto exposure, and a beam awareness system to detect and avoid obstacles. NEUTRONIX provides field-support and training for any technical questions or needs. Its open platform allows for further customization and integration into other processes, making sure that QUINTEL Ultraline 7000 mask aligner is an effective and reliable choice for the advanced microelectronics fabrication process.