Used QUINTEL Q4000 IR #9258221 for sale

QUINTEL Q4000 IR is a state-of-the-art mask aligner specifically designed for photolithography. It is highly efficient in producing refined patterns for a range of applications, including microelectronic circuits and optical components. Its many features and capabilities, including on-the-fly corrections and fast laser exposure, offer flexibility that help the user produce the desired pattern quickly and with great accuracy. The machine has a conventional box design, containing a source of ultraviolet light and both reflective and transmissive mask aligners. The source of light is the most important component of the machine, with a wavelength of frequency of 365nm or 248nm. These wavelengths enable high quality exposures with low UV absorption. The mask aligners are used for precise exposure of the patterns onto the substrate. Q4000 IR has a state-of-the-art imaging and control equipment made up of several components. These include a high resolution camera with a resolution capable of producing 2.5 µm images, a CCD (Charge-Coupled Device) image capture system, any-angle electronic alignment unit and a two-axis movement machine. The control of the machine is entirely electronic and is comprised of a high-accuracy stepper motor with a special micron-level digital control tool. QUINTEL Q4000 IR also offers a range of additional features, including autofocus, wafer cleaning, a programmable wafer holder, and adjustable exposure time. The high degree of automation of the machine allows for on-the-fly corrections and ensures an efficient and accurate process. Q4000 IR is also capable of acute numerical image processing, allowing for distortions and edge effects to be minimised. As such, the machine is suitable for a range of fabrications processes and is used for a wide array of applications. QUINTEL Q4000 IR is one of the most advanced mask aligners available and can guarantee excellent quality pattern definition and exposure. Its range of features and capabilities ensure a quick and accurate production of the desired pattern. This mask aligner provides a great cost/performance value and allows the user to benefit from high quality photolithography without having to invest vast amounts of money.