Used QUINTEL Q4000 #293636362 for sale

Manufacturer
QUINTEL
Model
Q4000
ID: 293636362
Wafer Size: 6"
Vintage: 2002
Mask aligner, 6" 2002 vintage.
QUINTEL Q4000 is an automatic mask aligner used for lithography in the semiconductor industry. It is ideal for the most demanding microelectronics applications, enabling advanced processes that are at the core of today's modern microchip manufacturing. QUINTEL Q 4000 boasts a robust, high-resolution stage which allows for precise alignment, with positioning accuracy of 20 nanometers. For larger substrates or reticles, the stage supports an impressive 2,500 mm (98.4") X-Y range. The load lock can accommodate up to four 300 mm reticles, providing high throughput and increased process efficiency. For precise alignment and registration, Q-4000 features an advanced shadow projection equipment. This system uses a precise laser source and specialized CCD detectors to ensure accurate alignment of both the reticle and the substrate. This allows for consistent and precise printing of complex patterns. Q 4000 uses a high-performance scan head and a programmable exposure source to enable precise control over exposure. It is also designed to work with various resist materials, offering users flexibility and increased process efficiency. QUINTEL Q-4000 also offers a range of automation features. The unit is equipped with a fully integrated robotic handling machine, allowing users to easily change substrates, wafers, reticles, and magnetic media. This allows for fast and consistent processing. Finally, Q4000 utilizes a sophisticated software package that simplifies programming and data analysis. It allows users to quickly design, debug, and modify digital circuits, while providing the ability to name and organize circuit components. The software also offers powerful analysis capabilities to identify and correct any errors before the silicon is created. Overall, QUINTEL Q4000 is an advanced lithography tool designed to increase yields and maximize tool utilization. Its impressive range of features, including its precise shadow projection asset, programmable exposure source and integrated automation, make it the ideal solution for high-performance design and manufacturing of microelectronics.
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