Used QUINTEL Q4000 #293638643 for sale
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QUINTEL Q4000 is an advanced automatic mask aligner with a host of features that make it ideal for many semiconductor fabrication processes. It is capable of achieving high precision patterns for a wide variety of devices. The design includes a highly accurate dual beam equipment and the world's fastest stepping motors for fast and accurate alignment. The system is equipped with a unique direct drive technology (DDT) for flat displacement control and flexible process optimization capabilities, allowing excellent device performance and improved yield. QUINTEL Q 4000 offers a high resolution imaging unit with a variable field of view, which is ideal for geometry-intensive applications. Its advanced patent pending machine and software options provide user-defined process settings, including focus settings, optical tool settings, and feature settings. In addition, Q-4000 provides numerous feature recognition capabilities, which are ideal for applications such as contact hole registration, fine line patterns, and IC layout alignment. The asset is capable of handling both planar and non-planar process steps to further customize processes and improve yields. Q 4000 also offers a variety of other benefits, such as automated wafer translation, wafer handling, and field of view change. The large wafer handling capability allows it to handle devices up to 5.16 inches in diameter. The Dual Beam Model provides excellent throughput, without compromising accuracy. An enlarged mask stage improves alignment accuracy and reduces distortion. Everything is ergonomically designed, making it easy to operate for a long time. In addition, QUINTEL Q-4000 provides excellent safety and environmental features, such as an inert gas curtain to prevent contact between the air filters and the masks. The equipment is also compliant with ISO certification requirements, ensuring the highest levels of quality and process control. In summary, Q4000 is an ideal choice for a wide range of semiconductor fabrication processes, due to its advanced design, fast speed and accuracy, and numerous process customization options. It provides excellent safety and environmental protection, as well as reliable and efficient manufacturing. The system's high resolution imaging and wafer alignment capabilities make it ideal for geometrically demanding processes, while its array of advanced options further enhances its versatility.
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