Used QUINTEL Q4000 #293696567 for sale
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ID: 293696567
Mask aligner
Wavelength: 365 to 436 nm
Light source with Hg Lamp: 350 W
Lamp working hours: ≥ 600
Main wavelength:
i-line: 365 nm
h-line: 405 nm
Illumination intensity
i-line: 22 mW/cm2
h-line: 50 mW/cm2
Uniformity: ≤ 5%
Exposure area: Φ100 mm
Exposure modes:
Proximity
Soft contact
Hard contact
Vacuum contact
Thickness: 1 µm
Substrate size: 3"
Mask size: 4" x 4"
Fix type: Top load
Gap setting range: 0-500 µm
User interface: Touch pad
Power supply: 100 V, 50/60 Hz, 20 A.
QUINTEL Q4000 is a highly advanced mask aligner equipment designed for high precision photolithography processes in semiconductor manufacturing, MEMS (Micro-Electro-Mechanical Systems) fabrication, and other microelectronics applications. This state-of-the-art equipment offers a range of features and capabilities that enable users to achieve extremely accurate alignment and patterning of photomasks onto substrates with sub-micron resolution. One of the key features of QUINTEL Q 4000 is its precision alignment system, which utilizes advanced optics and motorized stages to achieve alignment accuracies of up to 50 nm. This level of precision is crucial for ensuring that the patterns on the photomask are accurately transferred onto the substrate, resulting in high-quality and defect-free devices. The unit also includes a high-resolution imaging machine that allows operators to visualize and control the alignment process in real-time. Q-4000 is equipped with multiple illumination sources, including UV, deep UV, and near-UV options, to accommodate a wide range of photoresist materials and process requirements. The tool also features adjustable exposure parameters, such as intensity, exposure time, and energy dose, to optimize the lithography process for different applications and substrates. Additionally, QUINTEL Q-4000 offers proximity and contact exposure modes, giving users the flexibility to choose the most appropriate exposure method for their specific needs. In terms of productivity and throughput, Q4000 is designed for high-speed operation, with programmable automation features that allow for batch processing and rapid mask changes. This enables users to increase their production efficiency and reduce cycle times, making Q 4000 ideal for high-volume manufacturing environments. The asset also includes advanced software capabilities for recipe management, process control, and data analysis, facilitating seamless integration into automated production lines. Another key advantage of QUINTEL Q4000 is its versatility and flexibility, with a modular design that can be easily customized and upgraded to meet evolving technology requirements. Users can add additional functionalities, such as alignment marks inspection systems, wafer edge detection, and automated calibration tools, to enhance the model's performance and capabilities. QUINTEL Q 4000 is also compatible with a wide range of mask sizes and types, allowing users to work with various photomask formats and specifications. Overall, Q-4000 is a cutting-edge mask aligner equipment that combines precision, performance, and productivity to enable state-of-the-art photolithography processes in the semiconductor and microelectronics industries. With its advanced features, user-friendly interface, and robust construction, QUINTEL Q-4000 is a reliable and cost-effective solution for organizations seeking to achieve high-quality patterning and alignment results in their manufacturing processes.
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