Used SVG / PERKIN ELMER / ASML 240 #33408 for sale

SVG / PERKIN ELMER / ASML 240 Mask Aligner is a high-speed equipment designed to produce high-quality semiconductor products. It provides advanced patterning, alignment accuracy and alignment stability, while offering significant cost savings. This system is designed to align electron beam sensitive masks with extreme accuracy onto substrates of any size. SVG 240 unit is based on an integrated modular design, making it simple to use and cost-effective in terms of maintenance costs. It allows for fast, efficient, and accurate lithography of fabrication processes. This model includes advanced features, such as: two separate working stages for combined lithography, improved positional accuracy, and multiple point-based alignment. The motion stage of ASML 240 features precision-machined components and a closed-loop-controller that ensures accurate and smooth motion of the stage. The stepper motor provides highly accurate pattern transfer, with a repeatability of 2µm and a range of 2-20µm. The motion machine also supports angular alignment with a high-speed rotary table and high-precision rotary encoders to ensure accuracy. The design of the mask holder provides repeatable and reliable alignment with a steady-state accuracy of better than 0.5µm. The mask holder accepts a full selection of masks, including 4" to 6", 8" to 12", and up to 24" in size. It also supports highly engineered masks that require multiple-level patterning, positioning, and alignment. The tool also includes an advanced automatic alignment feature with several preset parameters, such as: pattern refinement, rule-based feature recognition, overlay metrology, and alignment optimization. The software suite also allows users to select from a range of lithography tools, including: image enhancement, optical proximity correction (OPC), and reticle placement. Overall, PERKIN ELMER 240 Mask Aligner is a highly efficient and cost-effective asset that can be used for fabrication of semiconductors. Its modular design and integrated features make it an ideal choice for advanced lithography applications.