Used SVG / PERKIN ELMER / ASML 340HT #5943 for sale

SVG / PERKIN ELMER / ASML 340HT is a state-of-the-art mask aligner used for optical lithography. It is capable of manufacturing dense, intricate microelectronic devices down to three microns thick with a high level of accuracy and alignment. The machine offers the highest level of precision, providing exceptional results for demanding applications. SVG 340HT mask aligner consists of two main components: a stage for positioning the mask and substrate, and a projection optics system. The stage offers five directions of motion and X-Y resolution of 0.5 microns. It is equipped with a motorized drive and motion encoders to detect motion errors, while a vacuum chuck holds the board and mask in place. The projection optics system features an enhanced UV projection lens that contains a precision elliptical diffraction grating. This ensures superior imaging and superior alignment accuracy. The alignment of the mask and substrate is achieved by ASML 340HT's alignment-on-the-fly technology. The machine locates the alignment marks on the substrate and calculates the relative positions of the mask, then aligns them. This allows for complex masks to be aligned in fewer steps and with improved accuracy of alignment. 340HT is highly versatile, as it is compatible with various substrates, such as quartz and silicon. It supports a wide range of illumination sources, ranging from standard UV to extreme-UV (EUV). It is also capable of exposing and imaging various patterns, including 0.25, 0.45 and 0.65 microns feature sizes. The machine is equipped with automated performance and feature-verification tools that provide real-time feedback regarding the alignment accuracy and exposure speed. It also features a high-resolution camera that displays the processed pattern, allowing for instant evaluation of any flaws. In short, PERKIN ELMER 340HT is a powerful and accurate mask aligner designed for precision micro-lithography applications. Highly versatile and capable of auto-aligning various masks, it is the ideal solution for applications requiring high levels of accuracy, resolution and alignment.