Used SVG / PERKIN ELMER / ASML 340HT #65071 for sale

ID: 65071
Wafer Size: 4"
Aligner System can be modified to any configuration.
SVG / PERKIN ELMER / ASML 340HT Mask Aligner is a versatile state-of-the-art masking and lithography equipment for semiconductor manufacturing. It combines the necessary exposure accuracy with a sturdy and reliable hardware design, ensuring high yields in lithography processing. The system utilizes a high-quality gate matrix along with its unique film exposure process to provide critical lithography accuracy from 8nm to 0.5um exposure. The unit includes a full-featured controller that is capable of controlling multiple tools with a single user interface. This allows for more efficient production and more accurate results. Unique exposure capabilities of the machine include Deep UV (DUV) lithography, advanced electron beam exposure, and advanced exposure control with the use of its advanced exposure controller. This ensures greater precision when it comes to patterns and features that required accurate resolution. The tool also features enhanced exposure accuracy, due to its uniform illumination technology. This assists in a variety of lithography processes, such as critical overlay, critical spacer, critical registration, and critical line edge roughness, as well as specialized applications like contact hole and die attach lithography. The asset is also designed to be extremely reliable and incorporates a range of features such as no vertical motion alarm, low speed motion alarm, and dynamic focus setting. Additionally, the model includes an integrated precision stepper, allowing for precise stepping and patterning of large areas with the least amount of runs. In addition, SVG 340HT Mask Aligner is designed for flexibility, and is compatible for use with a variety of different substrates and resist materials. The equipment also provides automated process sequencing for repetitive alignment processes and can be configured to various wafer handling systems for processing of small- to medium-sized substrate batches. Furthermore, ASML 340HT Mask Aligner includes a range of highly sophisticated CR and DR options, which offers the latest features in automation, improved data handling, and process control. The system also features a complete set of diagnostics, including tests for no download, and complete scan and exposure recording. Overall, PERKIN ELMER 340HT Mask Aligner is a state-of-the-art, sophisticated, and versatile unit for semiconductor production. Combining precise resolution and accurate exposure accuracy, along with superior reliability components, 340HT is an ideal choice for throughput and yield optimization.
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