Used SVG / PERKIN ELMER / ASML 500 series #84336 for sale

SVG / PERKIN ELMER / ASML 500 series are high-precision mask aligners used for lithography applications in semiconductor packaging and microelectronic device manufacturing. The aligners are capable of controlling the exposure of photoresist and other materials with extremely high precision, to facilitate the transfer of desired features into prepared substrates. These photolithography machines are equipped with a variety of features specifically designed to ensure accuracy with every exposure. An automated wafer Loading/Unloading equipment ensures that wafers are aligned and loaded/unloaded quickly and safely. To ensure accuracy, each wafer placement is verified, and a digital library of wafer movements is maintained to prevent errors from occurring. A wafer alignment system then scans and verifies the position of each wafer, and subsequently the exposure light source, to guarantee the desired exposure pattern. Additionally, a computer-controlled lifetime monitoring unit monitors the performance of the machine and informs the user of any changes necessary to make to remain optimally efficient. In order to obtain the best possible result from SVG 500 series aligners, various parameters must be controlled, such as the position of the exposure light source relative to the wafer, exposure time, and the lenses used to maximize resolution. The exposure wavelength is also adjustable, with a variety of available wavelengths including 248nm, 193nm, and 365nm. Additionally, optical filters can be used to adjust the intensity of the light emitted by the light source. The exposure machine can be adjusted to take into account the effect that surface reflectance has on the exposure pattern. To do this, an optional optical fiber attached to a projection lens tool is used to illuminate reflections on the material's surface, helping to prevent incorrect alignments and improve exposure accuracy. ASML 500 series aligners feature easy to use and powerful user interfaces, allowing for quick setup and programming of the machine for each use. Users are also able to quickly customize the machine settings to best suit their application needs. To optimize the mask aligner's performance, several process diagnostics are provided by the asset, such as end point and actuator position control, as well as an analysis of the wafer's thermal profile. Additionally, the model provides process traceability, allowing for the detection of any errors that may occur during the exposure process. In conclusion, 500 series mask aligners provide the precision, speed and user-friendly features needed to deliver accurate and consistent exposures with every use.