Used SVG / PERKIN ELMER / ASML 551 HT #9165929 for sale

SVG / PERKIN ELMER / ASML 551 HT Mask Aligner is a state-of-the-art, automated, wafer-level lithography equipment designed for patterning and alignment of circuits on wafers. It offers precise and accurate exposure capabilities, allowing for features with an accuracy down to 100nm. It has a smaller size and lower cost than comparable lithography systems, making it an excellent choice for high volume chip production. The system uses interference mapping to align the mask patterns precisely over a substrate, and can accommodate substrates up to 6 inches in diameter. It is composed of a light source, a lens, a slit rotor holding the masks, and an alignment detector. The Mask Aligner is capable of imaging wafers with a minimum line/space pattern of 0.5um, a minimum area of 0.2um x 0.2um, and an exposure repetition accuracy of 0.1um. The machine functions with the help of a high precision motor, which delivers precise and accurate motion control. It is composed of a high-resolution linear encoder, which provides a means to accurately measure the optical calculations used in lithography. The unit can also accommodate 100mm and 150mm wafers. It is outfitted with a fine adjustment mechanism, which makes it easy to align the mask patterns with the substrate. The machine is equipped with an automated model and keyframe programming feature that can store up to 20 keys, enabling users to recall patterns quickly and accurately. SVG 551 HT Mask Aligner includes a Number of advanced control features, including a 3.5" LCD display which allows the user to easily adjust alignment parameters. Additionally, the tool features a built-in auto-calibration feature, which eliminates the need for manual corrections prior to each exposure. In addition, the asset includes a comprehensive software package that includes a user-friendly graphical user interface. This allows the user to quickly and intuitively make the necessary adjustments to the model. The software can also be used to store programmable parameters, eliminating manual re-programming of masks for subsequent runs and allowing for quick retrieval of stored patterns. Overall, ASML 551 HT Mask Aligner is an ideal choice for a wide range of lithography needs. It offers precise and repeatable exposure capabilities for high volume chip production, as well as a variety of advanced features such as automated alignment and calibration.