Used SVG / PERKIN ELMER / ASML 551 HT #9377427 for sale

SVG / PERKIN ELMER / ASML 551 HT mask aligner is a tool used in semiconductor and nanotechnology fabrication processes. It utilizes a combination of photolithography and precision alignment to allow for the etching of circuits and features onto the substrate. The machine is capable of providing alignment accuracy of less than 1µm and can handle substrate sizes ranging from 5" to 8" in diameter as well as chip sizes up to 12". At its core, the mask aligner is composed of two basic subsystems: the stages, which are responsible for accurately positioning substrates and masks relative to each other; and the light source, which is responsible for exposing the photoresist on the substrates. The stages are composed of two X-Y linear translation stages (or "tables") which are connected to two rotary stages. The two rotary stages rotate in an XY plane with precision accuracy of 0.007 degrees. The X-Y linear stages move the substrates and masks in three dimensions with a repeatable accuracy of better than 1µm. In addition, the stages have a wafer lift system which is designed to keep the substrates in place during the exposure process. The light source is a photomask projection system which is capable of illuminating the photoresist with up to 245nm of ultraviolet light (UV-C). The light source has programmable UV-C intensity and exposure time, allowing for fine control of the exposure process. SVG 551 HT is a versatile tool for device fabrication. With its highly precise stages and powerful light source, the mask aligner is capable of creating feature sizes down to a few microns. It can also be used to create standard lithography masks, as well as semiconductor devices, such as digital logic circuits, memory chips, and nano-scale transistors.