Used SVG / PERKIN ELMER / ASML 554 HT #293645518 for sale

SVG / PERKIN ELMER / ASML 554 HT mask aligner is a equipment used for photolithography applications, such as in the production of semiconductor devices. It is used to transfer patterns from a mask onto a substrate. The system offers high throughput and precision, making it suitable for production of advanced semiconductor devices with high pattern repeatability and accuracy. The unit features a projection machine which includes a 5x reduction projection lens, quartz lamp and flat field condensing lenses. The quartz lamp ensures optimal illumination and high throughput, while the projection lens offers a high resolution image, showing fine details accurately. The projection lens has an N.A. of 0.55 and a numerical aperture of up to 0.45. The illuminating element also consists of a monochromatic laser source and a set of diffractive optical elements for improved resolution and contrast. The tool also has a stepper stage with a range of 0.7 to 6.0 µm. The absolute stage accuracy of 0.3 µm +/- 0.1 µm allows for precise alignment of patterned masks and substrates. To ensure repeatable results, the stepper is temperature controlled and temperature regulated. The stage can be operated in a manual or an automated environment. In addition to the stepper, the aligner asset also includes an X-Y stage which has a scanning range of up to 4 mm. This is used for overlaying multiple substrates in the same alignment model. Both stepper and X-Y stages are equipped with encoders to measure their position, allowing for highly accurate and repeatable substrate alignment. The equipment also has an automated mask loader to feed in patterned or chrome masks, or contact alignment masks. The mask tiler allows for higher throughput by positioning multiple masks side by side on the same substrate. This can be done quickly, as the tilter has a 2.4-4 degree stage for accurate positioning of multiple masks. SVG 554 HT mask aligner is a versatile and advanced system for photolithography applications. The unit features high resolution projection optics, accurate stepper and X-Y stages, and automated mask loader. Combined with a high throughput, this machine is well-suited for the production of high-quality semiconductor devices.