Used SVG / PERKIN ELMER / ASML 641 HT #9194296 for sale

SVG / PERKIN ELMER / ASML 641 HT is a high throughput scanning electron beam exposure stepper, which is commonly used in lithography and mask aligner operations. This automated equipment employs a step and repeat algorithm which allows precise alignment of patterns on the mask during repeated exposures on the same substrate. SVG 641 HT features a high resolution pattern generator consisting of an x-y linear stage, an x-axis rotary stage, and a beam deflector. The x-y linear stage is driven by a high speed servo motor, which facilitates high throughput in addition to precision pattern alignment. The x-axis rotary stage is used to modify the pattern orientation in the x-y plane, allowing for targets with various alignments to be accommodated. The beam deflector is designed to electronically adjust the focal point of the electron beam that is placed on the substrate, allowing for more accurate pattern positioning and higher resolution images. ASML 641 HT is equipped with a precise laser interferometer system that enables accurate pattern alignment on the substrate. This unit consists of three beams that enable the mask aligner to measure the relative distances between the laser beam points and the scanning electron beam exposure surface in order to determine the exact placement of the pattern on the substrate. PERKIN ELMER 641 HT also features high accuracy scanning optics, which enable accurate and repeatable alignment of the pattern on the substrate. This machine utilizes two galvanometer scanners that are configured to scan an electron beam in two perpendicular axes. These scanners operate in synchronous motion across the surface, which allows for precise control of the data collected by the tool. In addition, 641 HT includes an on-board controller which allows for automated operation of the asset. This controller allows for electronic control of the various model parameters such as the beam deflection position, exposure time, voltages and currents, and many others. The controller also allows for pattern programming and real-time control of the equipment, which can be used to respond quickly to changing conditions in the laboratory. In conclusion, SVG / PERKIN ELMER / ASML 641 HT is a high throughput scanning electron beam exposure stepper used in lithography and mask aligner operations. This automated system employs a step and repeat algorithm allowing for precise alignment of patterns on the mask during repeated exposures on the same substrate. It integrates various features such as a precise laser interferometer unit, high accuracy scanning optics, and an on-board controller enabling automated operation of the machine. SVG 641 HT is an excellent choice for lithography and mask aligner work.