Used SVG / PERKIN ELMER / ASML 641 HT #9198310 for sale

SVG / PERKIN ELMER / ASML 641 HT
ID: 9198310
Wafer Size: 5"
Mask aligner, 5" Process: Litho.
SVG / PERKIN ELMER / ASML 641 HT is a mask aligner designed for the fabrication of high precision photomasks. Developed as an extension of the existing SVG 641 series of exposure systems, SVG 641 HT is specifically designed for demanding Electronics Manufacturing Services (EMS), Photonic and Semiconductor Precision Mask Making applications. ASML 641 HT mask aligner features an integrated tester, pre- and post- align delta vector measurement capabilities, turntable calibration, an auto-leveling alignment table, and a 500 watt laser illuminator for exceptional accuracy in placement and alignment of photomasks up to 6" in size. As part of the comprehensive precision mask making package, the HT version of the 641 is supplied with a reliable and accurate exposure equipment. The mask aligner allows for fine adjustment of exposure parameters such as dose, speed and focus, and allows for semi-automated and/or manual programming of mappings or wafer to photomask alignment for fabrication of complex multi-dimensional precision photomasks. The HT version of ASML 641 series takes precision mask making to a new level with a highly reliable, efficient and repeatable alignment system. The unit includes advanced technology and features that enable greater precision in alignment including a linear motor drive that is able to quickly move a mask stage up to ± 30 milliseconds. These motors also allow the machine to automatically re-calibrate itself after any non-linear movement. The tool features a nine-axis, in-plane pre-align and post-align feedback loop along with an XY field monitoring asset that minimizes vibration and reduces thermal drift ensuring accuracy in alignment at all times. The HT model also includes fully integrated reticle and tape handling capabilities for both reticle and wafer alignment. The model is able to accommodate multi-grid reticles using edge registration for up to four different grids and is capable of accommodating the most complex reticles used for the fabrication of state-of-the-art photomasks. In addition, the equipment is also capable of processing high volume tape feeders to accommodate mask to wafer matching. PERKIN ELMER 641 HT is a versatile, advanced, user friendly, and extremely accurate mask aligner designed for the most demanding of photomask fabrication needs. With its advanced technology and features, the HT model is capable of producing the highest precision photomasks with very short turnaround times to meet the demands of the EMS, photonics and semiconductor industries.
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