Used SVG / PERKIN ELMER / ASML 641 #9105485 for sale

SVG / PERKIN ELMER / ASML 641 Mask Aligner is a highly advanced piece of optical profiling equipment that is designed for the production of accurate sub-micron and nano-scale integrated circuits. This equipment uses a combination of advanced optical imaging, pattern placement, and alignment to provide superior resolution and speed. The system features a 5-axis, 6 x 2 inch alignment stage for precise pattern placement on the mask and substrate. It has a 5 inch (127 mm) optical path for maximum resolution and focus, a proprietary aligned illumination unit which produces flat-field illumination, a downward light into illuminator, and on-axis imaging optics for unmatched detail and focus. The machine also provides the flexibility to produce either a single or batch pattern placement with accuracy down to 0.1 micron and up to 1 micron. SVG 641 Mask Aligner provides advanced imaging capability. It has a high-performance imaging stage that provides for a clear and detailed image for all pattern placements. An optimised imaging and best mode alignment tool is also included for precise image capture and alignment. This asset is designed to produce the highest possible resolution and accuracy from the masks. The model is equipped with an array of features to ensure maximum productivity and accuracy. It has an in-field calibration equipment for maximum measurement accuracy, a smart vision guidance system, and a patented design optimizer which automatically optimizes the unit parameters. The machine also has a user-friendly graphical user interface and it is able to connect to a network or computer for remote control and monitoring. ASML 641 Mask Aligner is an ideal tool for integrated circuit design and fabrication. Its ultra-high resolution imaging and pattern placement capabilities make it an invaluable tool for the development of advanced precision circuitry. It provides greater flexibility and accuracy than standard lithography systems while ensuring the highest levels of efficiency and accuracy.