Used SVG / PERKIN ELMER / ASML 651HT #293605029 for sale

SVG / PERKIN ELMER / ASML 651HT Mask Aligner is a high-precision equipment used in the manufacture of semiconductor integrated circuits and integrated optical systems. The system is used to accurately position a reticle on a photomask and to precisely align two or more layers of patterned mask material and hence create a large-scale structure of desired geometries and complexity. The unit combines laser interferometric alignment and high-precision stepper-motor and imaging optics to achieve alignment accuracy of less than 0.15 μm (at 10σ) across a 450 mm wafer and a reticle area. The machine features a large and customisable field of view for the nanofabrication and alignment of large substrates and reticles, using optics, a reticle loading and exchange tool and film scanner. The horizontal and vertical field of view for the asset is ±30 mm for the reticles and ±200 mm for the wafers, respectively. Meanwhile, the range of alignment distances is 0.02 μm - 5.6 mm, adjusted with linear 5 μm resolution. The model is also well equipped with image acquisition technology, providing the ability to create repeatable and accurate height and alignment maps. It also stores pixel height and alignment data and supports data export to external PCs or databases. Furthermore, the equipment supports the integration of multiple laser sources, improved photomask alignment, deposition rate and overlay accuracy through the use of a combination of visible and ultraviolet (UV) imaging. SVG 651HT is also designed to facilitate the integration of advanced correction algorithms, including auto-focus correction and centre of pattern recognition (COPR). It provides auto-focus, alignment and life monitoring capabilities that make it an ideal choice for advanced production processes. Its automated reticle exchange capability enables quick and efficient swapping of reticles and facilitates processes involving multiple reticles. Overall, ASML 651 HT Mask Aligner is a versatile and precise tool for the manufacturing of semiconductor integrated circuits and integrated optical systems. It features a large range of alignment distance options, large field of view and a wide range of imaging technology and correction algorithms to ensure accuracy and efficiency.