Used SVG / PERKIN ELMER / ASML 651HT #9259118 for sale

SVG / PERKIN ELMER / ASML 651HT Mask Aligner is an advanced rapid prototyping tool used in mask making and assembly optical-alignment lithography. A mask aligner is a scan type direct writing tool used in production level semiconductor and related industries for modifying thin film devices like photoresistors, thin-film transistor (TFT) arrays, and capacitors. SVG 651HT is designed for Submicron processing and can accurately perform both planarization/geometrical alignment and alignment drift and warpage compensations. ASML 651 HT Mask Aligner is composed of four major sub-systems; the optical equipment, scan system, alignment unit and projection/lithography machine. The optical tool consists of an exquisite zoomed objective lens (focusing from 0.150 mm to 0.34mm) and a set of four motorized mirrors for high-precision scanning and projection. The scan asset is based on a Piezo stepping mirror as well as a rotary mirror for three-dimensional alignment and provides the image field of the required size with deflection angles up to 90°. The alignment model makes use of high accuracy auto-centering stage with manual adjustment and a stepper motor for fast and accurate alignment. The projection/lithography equipment of SVG / PERKIN ELMER / ASML 651 HT is made up of an active illuminator designed for 700nm to 830nm illumination and an attenuator/smoother that keeps the uniformity of light intensity and its homogeneity. The micro-lithography system is also capable of angular alignment and field angles up to 350 microns. It is compact in size and only takes 80x80 cm of space. ASML 651HT is easy to install and can be connected with various process environments for automation. The tool comes with its own built-in PC and runs a Windows-based software for controlling the projector/mask aligner. Its comprehensive graphical user interface (GUI) makes the setup and operation of the tool a breeze. 651HT is equipped with a variety of advanced features like multi-field octagon scan, backdraw length, fast alignment routine, process optimization, and automatic beam position correction. In conclusion, SVG 651 HT Mask Aligner is an exemplary tool for mask making and assembly optical-alignment lithography due to its precise and accurate performance. With its advanced features that enable an easy and user-friendly operation, it is suitable for both research and production level semiconductor.