Used SVG / PERKIN ELMER / ASML 651HT #9399540 for sale
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ID: 9399540
Mask aligner
HG Lamp uniformity high: >13%
Scan speed low: 0.34"/s
Frequently unit: Arm stuck
Reworked unit: Assembly gear unit
Motor and gear assembly
Vacuum cups
Air gauge: Auto focus calibration
Offset evaluation: Nozzle
OPC 121: 480 µm
Wafer screws adjustment: 89 cm, -34cm, 163cm
OPC 122: -2.1 µm
Focus coarse adjustment:
OPC 11: -9.5 µm
0.7µm/cm -0.1µm/cm
Open slit unit: 4.9% (13%)
Scan speed: 0.55”/s - 1.045"/s
Input elevator (Height and flag adjustment)
PCB Labelled: Right and left hand card cage
Parameter: OPC 240: -4PPM, 2304: 0 -0.25, -0.1 µm.
SVG / PERKIN ELMER / ASML 651HT is a high-performance mask aligner designed specifically for very high throughput wafer stepper applications. It features a Pentium processor-based embedded microcontroller, along with a high-speed, integrated memory controller and a high-speed serial communications port. SVG 651HT boasts a variety of features, including a high-speed optical alignment mechanism that guarantees accurate alignment of masks and substrates. The mechanism consists of two positioners mounted on two independent stages, with the first used for fast imaging and the second employed for fine adjustment. The finely tuned optics of ASML 651 HT contribute to reduce exposure times significantly. The two stage alignment integrated in 651HT also includes a unique microscope imaging platform, allowing for a multitude of configurations of masks and substrates. The microscope is equipped with an anti-static protector to prevent particles from attaching to the sensitive electrostatic chuck, and the imaging equipment is sensitive enough to detect even single micron features on a wafer. 651 HT features high-performance autofocus capabilities that allow it to continuously detect, measure and refocus the wafer to within one micron. The system also features an integrated high-precision alignment platform, which enables users to quickly adjust a large number of complex exposures without time-consuming recalibration. PERKIN ELMER 651 HT's flexible software platform also allows users to explore a variety of pre-defined or custom user-defined parameters. A powerful feature includes the ability to move exposure area to enhance lithography control and optimize device production cycles. The whole unit can be easily operated via a text-based command interface. SVG 651 HT has been designed for low-attachment exposure processes, and its sealed housing helps to prevent contamination of the optics. In addition, its sturdy body is constructed from high-grade, temperature-resistant materials and is also shock-resistant, capable of withstanding high vibration and ESD shocks. SVG / PERKIN ELMER / ASML 651 HT is a reliable and efficient wafer stepper machine, able to perform difficult and accurate lithography processes, even at high speeds and throughputs. The highly advanced design enables ASML 651HT to deliver consistently high performance and accuracy in a wide range of complex exposure processes, making it an excellent tool for high-speed lithographic production.
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