Used SVG / PERKIN ELMER / ASML 661 HT #293765674 for sale
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ID: 293765674
Wafer Size: 6"
Mask aligner, 6"
Loadlock cassette type: M500/600
No SMIF
Cassette stage: 150 mm
Wafer mapping
Optical sensor
Blower
OS-2000 Controller
Air cooler: 39,000 BTU
Wafer fluoroware cassettes: 150 mm
Electronic motorized carousel arm
Pellicle protection mask cassette system
Cassette and carrier round mask: 7.25"
Life mask X, Wafer X and Pre-aligner anchor flexures
Optical:
High-Throughput coated optics (HT)
UV4 Filter and narrow band secondary
Integrated uniformity tester
Automated Uniformity Testing (AUDIT)
Focus / Viewing / Mag:
Air guage focus system
Extented life gauge head flexure
Automatic Variable Magnification (AVM)
Brightfield and darkfield viewing
Gas scan
Power supply: 220 VAC, 3 Phase.
SVG / PERKIN ELMER / ASML 661 HT is a high-precision mask aligner designed for IC lithography applications. This advanced mask aligner features an advanced alignment architecture with an accuracy of 1.2 μm. SVG 661 HT also features an ultra-high resolution optical equipment with a minimum spot size of 12 μm. In addition, ASML 661 HT has a wide range of imaging functions including 4x binning, defocus control, and a multiple illumination system. These imaging functions allow for quick and precise alignment of IC masks in semiconductor processing. 661 HT utilizes a four-point, high-precision integrated design that ensures accurate and repeatable alignments. This design also includes autofocus and multiple-level scan and stitch capability that helps to automate the mask alignment process. PERKIN ELMER 661 HT also offers powerful image processing functions such as binarization, contrast enhancement, and edge sharpening. These functions allow for further optimization of image quality and alignment accuracy. SVG / PERKIN ELMER / ASML 661 HT is also equipped with a high-speed and low drift SSMB (Scanning Stage Movement Block) mechanical stage for precise substrate alignment. This stage is driven by a brushless motor and has a maximum step resolution of 0.1 μm. SVG 661 HT also features a high power illumination unit with variable laser output power and adjustable laser parameters. This machine allows users to reduce the exposure time and increase the uniformity of the substrate's exposure. To further enhance ASML 661 HT's versatility, the tool is equipped with an optional icontrol software package. This program allows control of 661 HT's features and its many alignment functions. The icontrol software also provides graphical tools for alignment and imaging. PERKIN ELMER 661 HT's superior features, coupled with its outstanding precision and capability, make it an ideal tool for advanced IC lithography applications.
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