Used SVG / PERKIN ELMER / ASML 661 HT #293811482 for sale

SVG / PERKIN ELMER / ASML 661 HT mask aligner is a fully-featured tool designed for the production of advanced photolithography masks. This mask aligner combines the powerful SVG software suite with state-of-the-art components to deliver exceptional results in a wide range of applications. The equipment is equipped with a 2048 x 2048 resolution monitor and an advanced automation system that provides reliable alignment of patterning steps. Additionally, a powerful optical unit is included, which allows for pattern transfer to the apertured film with unmatched precision. In order to ensure optimal results, SVG 661 HT mask aligner features a high-resolution optomechanical alignment machine that is capable of accurately locating the photomask for each face-to-face exposure. This ensures minimal off-axis movement and high flatness, which is ultimately essential for successful pattern transfer. The tool also includes a high-resolution pressure measuring asset, which can detect any applied pressure with extremely high accuracy. In terms of positioning accuracy, ASML 661 HT mask aligner is capable of achieving extremely tight tolerance. It offers an X-Y repeatability of as low as 0.0005mm/100μm, along with a Z-axis repeatability of 0.7nm/100μm. In addition to this, the model provides a variety of edge targeting and focus functions, which allow for efficient integration with existing process steps and routine tasks. Furthermore, features such as the XY shift and hole alignment allow for increased complexity in pattern transfer. 661 HT mask aligner is renowned for its reliable results, but this is only possible thanks to its advanced components. The equipment is powered by a cutting-edge chip technology to ensure maximum process reproducibility. Additionally, this mask aligner uses a thick layer of polyurethane rubber, which significantly reduces vibration and improves image clarity. In conclusion, PERKIN ELMER 661 HT mask aligner is the ultimate option for the production of photolithography masks. Its advanced optomechanical alignment, high-resolution pressure measurements, and tight tolerance capabilities ensure optimal results in a wide range of tasks. Moreover, the system is powered by cutting-edge chip technology and robust components, providing maximum reliability.