Used SVG / PERKIN ELMER / ASML 661 HT #293827668 for sale

SVG / PERKIN ELMER / ASML 661 HT
ID: 293827668
Wafer Size: 6"
Mask aligner, 6".
SVG / PERKIN ELMER / ASML 661 HT Mask Aligner is a state-of-the-art lithography equipment that can be used to pattern features onto high-resolution microelectronic substrates. It is an advanced tool for mask fabrication that produces high-precision patterns with intricate shapes and structures. This machine is used in a variety of industries, such as semiconductor, solar cell and display manufacturing. SVG 661 HT Mask Aligner is an automated equipment tool made up of the following major components: an optical column, illuminator, photomask, work stage, vision system, focus control, and SEM/EDX analysis. Together, these components comprise a complete mask aligner unit, consisting of four main elements: optical column, illuminator, photomask and work stage. The optical column is a unit composed of multiple elements, including objective lenses, polarizers, quarter-wave plates and Beamsplitters, which is designed to produce a focused image and the associated incident light intensity profile. The illuminator is a light source that is used to generate a light field that illuminates the surface of the photomask. The photomask is a fine-etched metal substrate with a spin-coating photosensitive material applied to it that is then exposed to the light and transformed into a pattern of light and dark areas. The vision machine is a powerful and intuitive software-driven tool that allows the user to position and define various features on the photomask. The focus control asset is multi-dimensional and allows the user to accurately control the imaging parameters and focus position of the mask. The SEM/EDX analysis model, on the other hand, provides the user with invaluable detailed feedback on the lithographic process by providing in-depth information on the different surface features and their orientation to each other. ASML 661 HT Mask Aligner is a powerful tool for patterning high accuracy masks in a broad range of chip designs, enabling manufacturers to produce high-end designs efficiently and reliably. Its high processing speed ensures quick turnaround, while its automated processes and easy-to-use controls reduce time to market. This machine is also engineered to produce masks with extreme precision in terms of feature sizes, line widths and spacing, allowing users to achieve tight tolerances in all processes. Furthermore, its digital outputs enable users to transfer and store masks directly with different types of CAM/CAD, further streamlining the production process.
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