Used SVG / PERKIN ELMER / ASML 661 #9003993 for sale

SVG / PERKIN ELMER / ASML 661
ID: 9003993
Wafer Size: 6"
Mask aligner, 6".
SVG / PERKIN ELMER / ASML 661 is a mask aligner, which is a type of machine used to perform lithography. It is designed to be an accurate, efficient, and cost-effective device that can be used for various lithographic tasks. SVG 661 mask aligner has a linear stage design that makes the device small and compact, while providing precision and accuracy. It can reach up to 5,000 nm in size with an error of +/- 1.0 nm for 3-dimensional (3D) alignment, and +/- 0.5 nm for 2-dimensional (2D) alignment. It is also capable of adjusting the stage's position without the use of air bearings, meaning that it can maintain a high level of precision even when the stage is being adjusted. ASML 661 has an advanced light source equipment that uses 940 nm diode lasers, and can be used to expose wafers up to 100mm in size. It also has a control system that can be customized according to the customer's requirements. For example, the unit can be programmed with proprietary algorithms in order to maximize efficiency without sacrificing accuracy. The device also has a fully automatic alignment machine that can easily detect and image the mask on the wafer. The aligner also employs optional on-wafer alignment that allows the user to make micrometers and nanometers level adjustments without needing to manually rotate the stage. Finally, 661 mask aligner is also equipped with a contamination monitor, which will alert the user if the tool has become contaminated with dust or debris. This feature helps to ensure that the device remains clean and provides high-quality results. PERKIN ELMER 661 mask aligner is an advanced device that offers increased speed, accuracy, and efficiency. It can be used for a variety of lithographic tasks, and its advanced features allow for greater precision results.
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