Used SVG / PERKIN ELMER / ASML 661 #9210321 for sale

SVG / PERKIN ELMER / ASML 661 is an advanced wafer alignment tool designed for high precision mask registration and overlay during the fabrication of semiconductor devices. The equipment combines the precision of SVG e-beam lithography with the accuracy of ASML projection optical imaging. SVG 661 includes both single-pass and double-pass options, allowing users to select the degree of alignment accuracy required. The stepper-type wafer alignment system uses an advanced graphical user interface (GUI) to quickly determine the exact alignment of pre-defined patterns on the substrate. ASML 661 also includes a speech recognition unit which automatically adjust parameters and align substrates at pre-defined preset positions. The machine features a high-resolution optics package, an imaging tool and a precision stage. The optics are used to visualize the surface of the wafer and ensure that all alignment points are accurately aligned and within the allowable range. The imaging asset is composed of a medium-energy electron beam source and a low-energy electron beam source. The low-energy beam is used for characterization to detect flaws and defects in the substrate prior to the e-beam lithography process. The precision stage of 661 consists of a X, Y and Z axis allowing for precise motions during e-beam lithography and pattern registration. The stage also includes a servo-controlled probe and a fine movement axis. The fine movement allows for quick and accurate corrections in position when necessary. PERKIN ELMER 661 has high throughput and high accuracy, with overlay repeatability down to 3.5 nanometers. The model also includes an automatic inspection tool to ensure the reliability of the registration and overlay, as well as automatic registration of all lithographically printed shapes and features. SVG / PERKIN ELMER / ASML 661 is compatible with a wide range of photomasks and substrate materials, and is suitable for a variety of applications, including microelectronic, displays and MEMS components. This equipment is ideal for semiconductor fabricators and device integrators who are looking for high speed, precise alignment of complex patterns on wafers.